KLA—Tencor Corporation

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
 
 
G01N INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES 5201
 
 
 
G06F ELECTRIC DIGITAL DATA PROCESSING 5442
 
 
 
G01B MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS495
 
 
 
F21V FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR 2108
 
 
 
G01J MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY 276
 
 
 
G02B OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS 2203
 
 
 
G03F PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR 2102
 
 
 
G06T IMAGE DATA PROCESSING OR GENERATION, IN GENERAL 1134
 
 
 
H01S DEVICES USING STIMULATED EMISSION191
 
 
 
H05K PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS 1155

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
9921050 Spectral control systemApr 13, 16Mar 20, 18[F21V, G01N, G02B, G01B]
9903711 Feed forward of metrology data in a metrology systemApr 04, 16Feb 27, 18[G01N, G01B, G03F]
9897433 Method and system for regional phase unwrapping with pattern-assisted correctionDec 28, 15Feb 20, 18[G01B]
9719940 Compressive sensing with illumination patterningOct 05, 15Aug 01, 17[G01J, G01N, G03F]
9529182 193nm laser and inspection systemJan 31, 14Dec 27, 16[G01N, G02B, H01S]
9097577 Adaptive optics for compensating aberrations in light-sustained plasma cellsJun 21, 12Aug 04, 15[H01J, F21V, G01J, G02B]
9019491 Method and apparatus for measuring shape and thickness variation of a waferJun 18, 12Apr 28, 15[G01N, G01B]
8995746 Image synchronization of scanning wafer inspection systemMay 21, 13Mar 31, 15[G06T]
8903541 Method and arrangement for positioning electronic devices into compartments of an input medium and output mediumMar 30, 11Dec 02, 14[G06F, G01B, H05K]
8594823 Scanner performance comparison and matching using design and defect dataJul 12, 10Nov 26, 13[H01L, G06F]

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Expired/Abandoned/Withdrawn Patents

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